Systems and methods for generating EUV radiation from laser-produced plasmas

Abstract

Systems and methods for generating extreme ultraviolet (EUV) radiation using a laser-produced plasma EUV radiation source are discussed. The EUV radiation source may include a droplet generator configured to generate a plurality of droplets of a target material, and a laser source configured to generate a plurality of pulses of light interacting with a droplet of the plurality of droplets to form a plasma comprising extreme ultraviolet (EUV) radiation. The plurality of pulses of light comprise a first pulse configured to initiate a modification of a shape of the droplet, thereby forming a modified droplet, a second pulse configured to reduce a density of the modified droplet, thereby forming a rarefied droplet, and a third pulse configured to substantially ionize the rarefied droplet, wherein the second pulse comprises a light pulse having a wavelength in a range of

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