Methods for generating EUV beams, EUV-driven lasers for generating EUV beams, and their applications.

TW202633015APending Publication Date: 2026-08-01TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE
Filing Date
2025-12-03
Publication Date
2026-08-01

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Abstract

An EUV beam (12) is generated by converting a target (36) into a plasma state using a plurality of laser beams (30), wherein the method comprises: generating a plurality of laser beams (30) using a plurality of laser beam sources (20); and converting the target (36) into a plasma state by irradiating the target (36) with the plurality of laser beams (30). During irradiation of the target (36) with the plurality of laser beams (30), each laser beam (30) irradiates the target (36) for a time period (46). The time periods (46) overlap with each other within a time interval (48).
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