Semiconductor device
TW202633165APending Publication Date: 2026-08-01SAMSUNG ELECTRONICS CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-08-21
- Publication Date
- 2026-08-01
Smart Images

Figure TWG2TA001070284_001 
Figure TWG2TA001070284_002 
Figure TWG2TA001070284_003
Abstract
A semiconductor device includes a transistor, a first element spaced apart from the transistor in a first direction, a backside insulating structure below the transistor and the first element in a second direction that is perpendicular to the first direction, a passivation structure between the first element and the backside insulating structure, and a backside conductive pattern in the backside insulating structure and connected to the passivation structure, where the first element includes a first semiconductor region having a first conductivity type and a second semiconductor region having a second conductivity type and forming a PN junction with the first semiconductor region, the passivation structure includes a first insulating passivation layer contacting a lower surface of the first element and a conductive passivation layer below the first insulating passivation layer, and the backside conductive pattern is connected to the conductive passivation layer.
Need to check novelty before this filing date? Find Prior Art