Substrate processing system and substrate processing method

TW202633253APending Publication Date: 2026-08-01TOKYO ELECTRON LTD
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2025-07-23
Publication Date
2026-08-01

Smart Images

  • Figure TWG2TA001070217_001
    Figure TWG2TA001070217_001
  • Figure TWG2TA001070217_002
    Figure TWG2TA001070217_002
  • Figure TWG2TA001070217_003
    Figure TWG2TA001070217_003
Patent Text Reader

Abstract

[Problem] In an overlapping substrate formed by bonding a first substrate and a second substrate, the peripheral portion of the first substrate, which is the target of removal, is appropriately removed. [Solution] The control unit performs the following control: irradiating a plurality of points arranged in the thickness direction of the first substrate with laser light on the radially outer side of the inner periphery of the peripheral portion of the first substrate, or along the peripheral portion, to form a first modified region including a modified first modified portion and a first crack extending from the first modified portion; preventing the first crack from reaching the back side of the first substrate opposite to the second substrate; irradiating a plurality of points arranged in the thickness direction of the first substrate with laser light on the radially inner side of the first modified region to form a second modified region including a modified second modified portion and a second crack extending from the second modified portion; and ensuring that the second crack reaches the back side of the first substrate and connects with the first modified region.
Need to check novelty before this filing date? Find Prior Art