Cleaning method for substrate processing device and locking key

Abstract

[Problem] Preventing substrate from being contaminated by particulate matter generated from a locking key and components in contact with it. [Solution] A substrate processing apparatus that replaces a liquid film formed on the upper surface of a substrate with a supercritical fluid and dries the substrate. The substrate processing apparatus includes: a pressure vessel having a drying chamber for drying the substrate; a cover for closing the opening of the drying chamber; a locking key for restricting the cover from moving from a closed position (closing the opening) to an open position (opening the opening); and a cleaning unit for cleaning the locking key.

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