Substrate processing apparatus

Abstract

This invention relates to a substrate processing apparatus, and more specifically, to a substrate processing apparatus for performing pre-cleaning on a substrate. The invention discloses a substrate processing apparatus comprising: a process chamber (100) including a chamber body (110) and an upper cover (120), the chamber body (110) forming an internal space (S1) and having an opening (111) on its upper side, the upper cover (120) being disposed on the chamber body (110) to cover the opening (111) and to introduce process gas from the outside; a support frame (200) having a vertically penetrating center and disposed at the opening (111); and an inner liner (300) disposed on the inner surface (201) of the support frame (200) to define a processing space on its inner side. S2), and injects process gas introduced through the upper cover (120) into the processing space (S2); a substrate support (400) supports the substrate (1) being processed on it and is configured to be movable up and down so that the substrate (1) is located in the processing space (S2) when the substrate is being processed; a remote plasma generator (700) is disposed on the upper cover (120) and supplies the process gas to the processing space (S2) by plasma generation; wherein the inner liner (300) is formed of non-metal to prevent the process gas free radicalized through the remote plasma generator (700) from dissipating. none

Images