Scrubber for semiconductor apparatus
TW202633333APending Publication Date: 2026-08-01吳承桓
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- 吳承桓
- Filing Date
- 2024-08-20
- Publication Date
- 2026-08-01
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Abstract
A scrubber for semiconductor apparatus comprises an absorption tower for separating a gas mixture into a first gas and a second gas, a housing defining a first scrubbing space in which a first scrubbing process is performed, wherein the housing is disposed in the absorption tower, a first tray connected to a first inner wall of the housing and extending in a first direction intersecting the first inner wall, a first tray hole penetrating the first tray in a second direction intersecting the first direction and through which the gas mixture passes, and a solution supply nozzle for providing a first scrubbing solution for performing the first scrubbing process to an upper surface of the first tray, wherein the gas mixture passes through the first tray hole and rises in the second direction.
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