Scrubber for semiconductor apparatus

TW202633333APending Publication Date: 2026-08-01吳承桓
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
吳承桓
Filing Date
2024-08-20
Publication Date
2026-08-01

Smart Images

  • Figure TWG2TA001071634_001
    Figure TWG2TA001071634_001
  • Figure TWG2TA001071634_002
    Figure TWG2TA001071634_002
  • Figure TWG2TA001071634_003
    Figure TWG2TA001071634_003
Patent Text Reader

Abstract

A scrubber for semiconductor apparatus comprises an absorption tower for separating a gas mixture into a first gas and a second gas, a housing defining a first scrubbing space in which a first scrubbing process is performed, wherein the housing is disposed in the absorption tower, a first tray connected to a first inner wall of the housing and extending in a first direction intersecting the first inner wall, a first tray hole penetrating the first tray in a second direction intersecting the first direction and through which the gas mixture passes, and a solution supply nozzle for providing a first scrubbing solution for performing the first scrubbing process to an upper surface of the first tray, wherein the gas mixture passes through the first tray hole and rises in the second direction.
Need to check novelty before this filing date? Find Prior Art