Flow measurement device and flow measurement system

TW202633352APending Publication Date: 2026-08-01MURATA MASCH LTD
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
MURATA MASCH LTD
Filing Date
2026-01-23
Publication Date
2026-08-01

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Abstract

A flow measuring device is connected to at least one gas supply nozzle of a purification device and measures the supply flow rate of purified gas supplied from the purification device. The flow measuring device includes: at least one inlet connected to the gas supply nozzle for introducing purified gas; a primary piping connected to the inlet; a flow meter disposed on the primary piping and measuring the flow rate of the purified gas flowing through the primary piping; a plurality of secondary piping connected to the downstream side of the primary piping via branching sections; and a flow path switching section for switching the flow path of the purified gas to at least one of the plurality of secondary piping sections.
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