Substrate processing system and inspection method

Abstract

The substrate processing system disclosed in this invention includes a chamber, a module, and a control circuit. The module has at least one camera. The control circuit is configured to generate a panoramic image of the object being inspected within the processing space. The control circuit is configured to control the module to move at least one camera into the processing space. The control circuit is configured to control the module to acquire a first image of a first range and a second image of a second range from at least one camera. The control circuit is configured to generate a panoramic image from the first image and the second image based on a common feature pattern shared by the first image and the second image.

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