Systems, apparatus, and methods for multi-wavelength monitoring for semiconductor manufacturing

Abstract

The present disclosure relates to systems, apparatus, and methods for multi-wavelength monitoring for semiconductor manufacturing. In one or more embodiments, a system for processing substrates includes a chamber body at least partially defining an internal volume, one or more heat sources configured to heat the internal volume, a substrate support disposed in the internal volume, and a sensor assembly operable to measure energy of a plurality of wavelengths in the internal volume. The sensor assembly includes one or more optical sensors, a movable tray coupled to a motor, and a plurality of filters supported by the movable tray, the motor operable to move the movable tray to move the plurality of filters relative to the one or more optical sensors to respectively align the plurality of filters with at least one of the one or more optical sensors.

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