Measuring instrument, measuring system and measuring method
TW202633387APending Publication Date: 2026-08-01TOKYO ELECTRON LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-11-17
- Publication Date
- 2026-08-01
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Abstract
An exemplary embodiment of the measuring device of the present invention includes a first sensor, a second sensor, and a circuit board. The first sensor includes an imaging device for capturing images of both the mounting stage and the ring member within the same field of view. The second sensor includes either a first electrostatic capacitance sensor or a second electrostatic capacitance sensor. The first electrostatic capacitance sensor measures the electrostatic capacitance between the substrate and the ring member disposed to the side of the substrate when the substrate is placed on the mounting stage. The second electrostatic capacitance sensor measures the electrostatic capacitance between the substrate and the mounting stage disposed below the substrate when the substrate is placed on the mounting stage.
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