Semiconductor device, method for monitoring propagation length, and method for manufacturing semiconductor device

TW202633389APending Publication Date: 2026-08-01RENESAS ELECTRONICS CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2026-01-08
Publication Date
2026-08-01

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Abstract

Provide a technology that can estimate a propagation length. An evaluation element includes a diffusion layer formed in a semiconductor substrate and a plurality of a pair of contacts electrically connected to the diffusion layer. The plurality of the pair of contacts are separated by a distance in the X direction. A width of the third contacts in the X direction is smaller than a width of a second contacts in the X direction. The width of the second contacts is smaller than a width of the first contacts in the X direction.
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