Semiconductor device, method for monitoring propagation length, and method for manufacturing semiconductor device
TW202633389APending Publication Date: 2026-08-01RENESAS ELECTRONICS CORP
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2026-01-08
- Publication Date
- 2026-08-01
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Abstract
Provide a technology that can estimate a propagation length. An evaluation element includes a diffusion layer formed in a semiconductor substrate and a plurality of a pair of contacts electrically connected to the diffusion layer. The plurality of the pair of contacts are separated by a distance in the X direction. A width of the third contacts in the X direction is smaller than a width of a second contacts in the X direction. The width of the second contacts is smaller than a width of the first contacts in the X direction.
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