Substrate processing system

TW202633414APending Publication Date: 2026-08-01TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2025-12-08
Publication Date
2026-08-01

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Abstract

The substrate processing system disclosed in this invention includes a vacuum transfer module, a plurality of process modules, and a common transmission path. The vacuum transfer module has a vacuum transfer chamber. Each of the plurality of process modules includes a first side disposed along one side of the vacuum transfer chamber, a processing chamber connected to the vacuum transfer chamber at the first side, and a second side extending on the opposite side of the first side. The common transmission path is a transmission path for powering the plurality of process modules, mounted on the second side of each of the plurality of process modules, and extending along the second side of each of the plurality of process modules.
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