Semiconductor structure and manufacturing method thereof

Abstract

A semiconductor structure includes: an interconnect structure including a plurality of interconnect layers formed over a substrate and a storage structure in the interconnect structure. The storage structure includes a first electrode, a second electrode, and a first storage layer disposed between the first electrode and the second electrode. The storage structure includes a first portion in a first interconnect layer and a second portion in a second interconnect layer. The semiconductor structure further includes a shield structure disposed in the first interconnect layer and the second interconnect layer of the interconnect structure, wherein the shield structure surrounds the storage structure.

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