Radiosensitive linear components, patterning methods, acid diffusion control agents and onium salts

Abstract

The present invention aims to provide a radiosensitive linear composition, a patterning method, an acid diffusion control agent, and an onium salt with excellent sensitivity, LWR, and CDU during pattern formation. A radiosensitive linear composition comprises: an onium salt having a partial structure represented by formula (i), a polymer having a structural unit (I) containing an acid-dissociable group, and a solvent. (In formula (i), X1- is S- or O-; X2 is S or O; wherein at least one selected from the group consisting of X1- and X2 contains S; Z+ is a monovalent organic cation; * represents the bonds with other atoms in the onium salt.)