Carboxylic acid generating agent, resist composition, resist pattern manufacturing method and carboxylate

Abstract

The present invention aims to provide a carboxylic acid generator and a resist composition capable of producing resist patterns with good line edge roughness. A carboxylic acid generator contains a salt represented by formula (I). [In the formula, L1 represents a single bond or a substituted / unsubstituted hydrocarbon group, wherein the -CH2- in the group can be replaced by -O-, -S-, etc.; W1 represents a substituted / unsubstituted cyclic hydrocarbon group; X1 represents -O-, -CO-, etc., or a combination thereof; R1 represents a substituted / unsubstituted hydrocarbon group, wherein the -CH2- in the group can be replaced by -O-, -S-, -SO2-, -SO-, etc.; R3 represents a hydrogen atom or an acid-unstable group; R4 represents a halogen atom, cyano, nitro, or a substituted / unsubstituted hydrocarbon group, wherein the -CH2- contained in the hydrocarbon group can be replaced by -O-, -S-, -SO2-, etc.; m4 represents any integer from 0 to 4; Z+ represents an organic cation.]