Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process

TW202633881APending Publication Date: 2026-08-16SHIN ETSU CHEMICAL CO LTD

View PDF 0 Cites 0 Cited by

Patent Information

Application Number: TW114135419
Authority / Receiving Office: TW · TW
Patent Type: Applications
Current Assignee / Owner
Priority Date: 2025-02-07
Filing Date: 2025-09-16
Publication Date: 2026-08-16

Application Information

Patent Timeline

07 Feb 2025

Priority

16 Sep 2025

Application

TW114135419

16 Aug 2026

Publication

TW202633881A

IPC: C07C309/42; C07C309/43; C07C309/73; C07C381/00; C07C381/12; C07D333/76; C08F212/14; C08F212/32; C08F220/38; C09K3/00; G03F7/004; G03F7/039; G03F7/20; G03F7/32; H10P76/00

Inventors: 福島将大

Get more patent work done with AI

Run novelty searches—or use them for FTO, design risk, drafting and technical problem-solving.

Explore More Agents

Novelty Search
Search existing technologies and assess novelty
↗
FTO
Analyze whether a product may infringe others' patents
↗
Design FTO
Check prior-design risk for exterior design
↗
Drafting
Draft patent application text based on a technical solution
↗
Find Solutions with TRIZ
Generate feasible solution to solve your technical challenge
↗
IP MCP Servers
Connect trusted patent search and cited evidence to Claude, Cursor or your own AI workflow
↗

Patent Text Reader

Abstract

are a sulfonium salt monomer having the formula (A), a polymer comprising repeat units derived from the sulfonium salt monomer, a chemically amplified resist composition containing the polymer, a pattern forming process using the chemically amplified resist composition. Herein, Z- is an aromatic sulfonate anion having a polymerizable group.

Need to check novelty before this filing date? Find Prior Art