Ethylene copolymers, their manufacturing methods, and cleaning agents for semiconductor components

TW202633939APending Publication Date: 2026-08-16TOAGOSEI CO LTD
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Patent Information

Application Number
TW114140256
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-21
Filing Date
2025-10-17
Publication Date
2026-08-16
Patent Text Reader

Abstract

Ethylene copolymers comprise building units (A) and building units (B). Building unit (A) originates from an ethylene monomer (A) having an acidic functional group and lacking an ester bond, while building unit (B) originates from an ethylene monomer (B) lacking both an acidic functional group and an ester bond. Ethylene copolymers are obtained, for example, by polymerizing a plurality of ethylene monomers, including ethylene monomer (A) and ethylene monomer (B), using a living radical polymerization method.
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