Substrate cleaning solution, method and apparatus for manufacturing substrates cleaned using the solution

TW202634052APending Publication Date: 2026-08-16MERCK PATENT GMBH
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115100086
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-06-03
Filing Date
2021-06-01
Publication Date
2026-08-16

Smart Images

  • Figure TWG2TA001073341_001
    Figure TWG2TA001073341_001
  • Figure TWG2TA001073341_002
    Figure TWG2TA001073341_002
Patent Text Reader

Abstract

The objective of this invention is to obtain a substrate cleaning solution that can clean substrates and remove particles. The solution provided by this invention is a substrate cleaning solution comprising an insoluble or sparingly soluble solute (A), a soluble solute (B), and a solvent (C), wherein the solvent (C) comprises water (C-1); and the content of the soluble solute (B) is 0.1 to 500% by mass, based on water (C-1).
Need to check novelty before this filing date? Find Prior Art