Composition for cleaning photoresist pattern
TW202634053APending Publication Date: 2026-08-16DONGWOO FINE CHEM CO LTD
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Patent Information
- Application Number
- TW115104182
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-05
- Filing Date
- 2026-02-03
- Publication Date
- 2026-08-16
Abstract
The present invention provides a composition for cleaning photoresist pattern including a monohydric alcohol compound, an ester compound with a specific structure, and water. The composition for cleaning photoresist pattern according to the present invention exhibits excellent cleaning power while preventing pattern collapse and damage during the cleaning of micro-patterns and minimizes the generation of impurities originating from the composition itself.
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