Process chamber improvement

Abstract

A processing system is provided including a process chamber that includes: a chamber body disposed around an interior volume; a substrate support in the interior volume; a gas inlet channel assembly including a first gas inlet channel and a second gas inlet channel. Each gas inlet channel is coupled with the interior volume, and each gas inlet channel is positioned at a different angular location around the substrate support. The process chamber further includes an exhaust inlet channel assembly including a first exhaust inlet channel and a second exhaust inlet channel. Each exhaust inlet channel is coupled with the interior volume. Each exhaust inlet channel is positioned at a different angular location around the substrate support. At least a portion of the first exhaust inlet channel directly underlies the first gas inlet channel. At least a portion of the second exhaust inlet channel directly underlies the second gas inlet channel.

Images