Assemblies and methods for two-channel measurements

TW202634216APending Publication Date: 2026-08-16ASML NETHERLANDS BV
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Patent Information

Application Number
TW114144398
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-17
Filing Date
2025-11-14
Publication Date
2026-08-16

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Abstract

Assembly for determining a characteristic of a structure on a substrate, comprising a radiation illumination dipole having first and second sources that are angularly offset to a transverse direction in an illumination pupil plane. The first and second sources irradiate a structure having a periodically repeating pattern along a transverse. A multi-part wedge is located in an exit pupil of the assembly, configured to receive from the structure: a lower radiation order and a higher radiation order of diffracted radiation of the first source on a first part of the multi-part wedge, and a lower radiation order and a higher radiation order of diffracted radiation of the second source on a second part of the multi-part wedge. A detector receives a first and second spatially separated images formed from first and second source radiation incident on the first and second parts of the wedge, respectively.
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