Continuous photolithographic fabrication process for producing seamless microstructures used in electro-optic displays and light modulating films

Abstract

A roll-to-roll method of fabricating seamless microstructures is provided, including the steps of: (a) continuously forming a laminated structure comprising a photomask film superimposed on a substrate with a layer of photo-sensitive material therebetween, the photomask film including a pattern of light-transmissive regions and light-blocking regions; (b) illuminating the photomask film of laminated structure formed in step (a) such that light passes through the light-transmissive regions of the photomask film to cure portions of the photo-sensitive material exposed by the light-transmissive regions, while leaving the remaining portions of the photo-sensitive material covered by the light-blocking regions uncured; (c) delaminating the photomask film from the photo-sensitive material selectively cured in step (b); and (d) removing the uncured portions of the photo-sensitive material to form a layer of microstructures on the substrate from the cured portions of the photo-sensitive material.

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