Method for examining a substrate body for a component in a lithography apparatus, substrate body and lithography apparatus

TW202634362APending Publication Date: 2026-08-16CARL ZEISS SMT GMBH
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Patent Information

Application Number
TW114136411
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-09-23
Filing Date
2025-09-22
Publication Date
2026-08-16

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Abstract

and c) ascertaining (S4), in spatially resolved fashion, one or more parameters (P) of the substrate body
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