Interferometric Exposure Apparatus and Interferometric Exposure Method

Abstract

An interferometric exposure apparatus and method are provided that can easily achieve exposure at various tilt angles and spacing widths. One embodiment of the interferometric exposure apparatus includes an optical system that overlaps and aligns a first beam and a second beam, obtained by splitting interferometric outgoing light, in an illumination region on an exposure surface, and performs interferometric exposure on an object disposed along the exposure surface. In the optical system, the incident angle of the exposure surface relative to at least one of the first beam or the second beam is variable, enabling the aforementioned interferometric exposure to be performed in an asymmetric mode where the first beam and the second beam are incident on the object in an asymmetric manner relative to the normal of the exposure surface in the illumination region.

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