Interference Exposure Device and Interference Exposure Method

Abstract

An interference exposure apparatus and method are provided that improve the accuracy of interference exposure caused by interference pulsed light without increasing the size of the apparatus. One embodiment of the interference exposure apparatus involves overlapping and aligning a first beam and a second beam obtained by splitting interference pulsed light in an illumination area on an exposure surface, and performing interference exposure on an object disposed along the exposure surface. The apparatus includes a beam splitter, an incident optical system, and an optical path adjustment unit. The beam splitter directs the first beam and the second beam to emit in different directions. The incident optical system directs the first beam and the second beam emitted from the beam splitter to the illumination area in such a way that their respective incident angles overlap. The optical path adjustment unit can move the beam splitter in such a way that the first beam and the second beam interfere within the illumination area.

Images