Apparatus and method for checking a component, and lithography system

Abstract

The present invention relates to an apparatus (1) for inspecting a component (2) having a periodic structure (3) having substructures (5) arranged on a lattice (4), the apparatus comprising at least a measurement radiation source (6) for generating measurement radiation (7) and an optical system (8). The apparatus (1) includes a shielding device (10) for influencing the phase angle of the measurement radiation (7), the shielding device (10) having a dual lattice (11) that is reciprocal to the target shape of the lattice (4), wherein the component (2), the measurement radiation source (6), the optical system (8) and the shielding device (10) are configured such that the measurement radiation (7) diffracts at the lattice (4) such that at least one of the zeroth order diffraction orders of the diffracted measurement radiation (7) at least substantially coincides with at least one point of the dual lattice (11). The invention relates to an apparatus (1) for checking a component (2) with a periodic structure (3) having substructures (5) arranged on a lattice (4), at least comprising a measurement radiation source (6) for creating measurement radiation (7) and an optics system (8). The apparatus (1) comprises a mask device (10) for influencing a phase angle of the measurement radiation (7), the mask device (10) having a dual lattice (11) which is reciprocal to a target shape of the lattice (4), wherein the component (2), the measurement radiation source (6), the optics system (8) and the mask device (10) are arrangeable in such a way that the measurement radiation (7) is diffracted at the lattice (4) in such a way that at least one of the 0th diffraction orders of the diffracted measurement radiation (7) is at least approximately coinciding with at least one of the points of the dual lattice (11).

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