Membrane removal device, membrane removal method, memory medium and membrane removal system

TW202634375APending Publication Date: 2026-08-16TOKYO ELECTRON LTD
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Patent Information

Application Number
TW114139282
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-24
Filing Date
2025-10-13
Publication Date
2026-08-16

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Abstract

[Problem] To suppress the occurrence of defects caused by substrate tilt when removing a film from the edge of a rectangular substrate. [Solution] The film removal apparatus disclosed herein includes: a mounting section for mounting a rectangular substrate on which a film is formed; a processing section including: a processing liquid supply port for supplying a processing liquid to the edge of the substrate surface to dissolve the film; and an exhaust port for venting air around the edge to remove dissolved material from the film and removing the film from the edge; a detection section for detecting the longitudinal and transverse positions of a plurality of locations on the edge of the substrate mounted on the mounting section; and a moving section for moving the processing section, which supplies the processing liquid from the processing liquid supply port, in the longitudinal and transverse directions based on data related to the longitudinal and transverse tilt of the substrate obtained from the aforementioned locations, in order to remove the film along the edge of the substrate.
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