Using generative artificial intelligence for focus and dose metrology and for generating reference images for charged-particle beam metrology

TW202634563APending Publication Date: 2026-08-16ASML NETHERLANDS BV
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Patent Information

Application Number
TW114147440
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-16
Filing Date
2025-12-04
Publication Date
2026-08-16

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Abstract

A non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of a computing device to cause the computing device to perform operations for tuning an image processing algorithm with constructed reference images. The operations include: using a decoder of an encoder-decoder model to construct new images having features with known reference values, wherein the encoder-decoder model has been trained with multiple target images with programmed reference values; extracting metrology values from the constructed new images using the encoder; calculating key performance indicators (KPIs) of the new images based on the extracted metrology values; and selecting the constructed new images whose KPIs are within a target range as reference images for tuning parameters of the image processing algorithm.
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