Multi-charged particle beam mapping apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam mapping method and data generation method

TW202634656APending Publication Date: 2026-08-16NUFLARE TECH INC
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Patent Information

Application Number
TW114145315
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-31
Filing Date
2025-11-20
Publication Date
2026-08-16

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Abstract

A multi-charged particle beam drawing apparatus, a data generation apparatus, a multi-charged particle beam drawing method, and a data generation method are provided to suppress the reduction in data processing speed within the multi-charged particle beam drawing apparatus and to generate drawing data with reduced data volume. Furthermore, a complexity calculation apparatus for calculating the complexity of graphics contained in design data is provided. According to one aspect of the present invention, the multi-charged particle beam drawing apparatus includes: a drawing unit that forms a multi-beam consisting of a plurality of charged particle beams, individually switches the beams ON / OFF on corresponding beams of the multi-beam, and irradiates an object with charged particle beams to draw a pattern; calculates the complexity of graphics contained in the design data, and when the complexity does not meet a threshold condition, monotonically divides the graphics in a predetermined direction, generates drawing data using graphics that meet the threshold condition, and controls the drawing unit based on the drawing data.
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