Methods and systems for arc suppression during semiconductor fabrication processes

Abstract

The techniques described herein relate to suppresion of arcs during plasma-based semiconductor processes. The techniques can include delivering radio-frequency (RF) power a plasma in a semiconductor processing chamber. The techniques can include detecting a first indication of a first arc event in the semiconductor processing chamber. In response to detecting the first indication of the first arc event, causing the RF power to the plasma to pulse. Causing the RF power to the plasma to pulse can include repeatedly causing the RF power to pulse on and off to suppress the first arc event.

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