Semiconductor device

TW202635003APending Publication Date: 2026-08-16SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
TW114129797
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-07
Filing Date
2025-08-05
Publication Date
2026-08-16

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    Figure TWG2TA001072542_003
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Abstract

A semiconductor device may include: a substrate; an active pattern on the substrate; a source / drain pattern on the active pattern; a channel pattern connected to the source / drain pattern, the channel pattern including semiconductor patterns that are spaced apart from each other; and a gate electrode extending in a first direction such as to cross the channel pattern, wherein the semiconductor patterns include a first semiconductor pattern, a second semiconductor pattern on the first semiconductor pattern, and a third semiconductor pattern on the second semiconductor pattern, wherein the gate electrode includes: a first inner part between the active pattern and the first semiconductor pattern; a second inner part between the first semiconductor pattern and the second semiconductor pattern; and a third inner part between the second semiconductor pattern and the third semiconductor pattern, and wherein a width of the first inner part is a smaller than a width of the second inner part and a width of the third inner part.
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