Material vaporization system, material vaporization method, and material vaporization program

Abstract

This invention achieves stable flow control of material gas while accurately controlling parameters related to the amount of material. It includes: a vaporizer 21 for vaporizing material to generate material gas; a supply adjustment device 22 for adjusting the amount of material supplied to the vaporizer 21; and a control device 4 for controlling the supply adjustment device 22. The control device 4 includes: an estimation value calculation unit 44 for calculating estimated values ​​of parameters related to the amount of material in the vaporizer 21 based on the supply amount Qin of material supplied to the vaporizer 21 and the amount of material gas discharged from the vaporizer 21 Qout; and a supply amount control unit 45 for controlling the supply amount adjustment device 22 based on the estimated values. The present invention enables stable flow rate control of material gas while accurately controlling parameters related to the amount of material, and comprises: a vaporizer 21 for vaporizing material to generate material gas; a supply amount adjustment device 22 for adjusting the amount of material supplied to the vaporizer 21; and a control device 4 for controlling the supply amount adjustment device 22. The control device 4 includes: an estimated value calculation unit 44 for calculating an estimated value of a parameter related to the amount of material in the vaporizer 21 based on the supply amount Qin of material supplied to the vaporizer 21 and the output amount Qout of material gas derived from the vaporizer 21; and a supply amount control unit 45 for controlling the supply amount adjustment device 22 based on the estimated value.

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