Workpiece holding mechanism, exposure device, and workpiece holding method

Abstract

A workpiece holding mechanism, an exposure apparatus, and a workpiece holding method are provided, capable of reliably holding a workpiece on a stage. One aspect of the workpiece holding mechanism includes a stage, a pressing mechanism, and a clamping mechanism. A plate-shaped workpiece is placed on the stage. The pressing mechanism has a plurality of protrusions, provided independently of the stage, arranged to contact the peripheral portion of the workpiece from the surface opposite to the stage, thereby pressing the peripheral portion of the workpiece against the stage. The clamping mechanism has a clamping portion provided on the stage, configured to contact the peripheral portion of the workpiece from the surface between the protrusions without interfering with the plurality of protrusions, thereby pressing the peripheral portion of the workpiece against the stage.

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