Methods for determining a temperature achieved by a heating process

TW202635112APending Publication Date: 2026-08-16TOKYO ELECTRON LTD
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Patent Information

Application Number
TW114136300
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-08-04
Filing Date
2025-09-22
Publication Date
2026-08-16

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Abstract

A method for determining a temperature achieved on a substrate by a heating process includes receiving the substrate including a metal containing layer disposed over a first layer, the metal containing layer including a metal, the first layer including a first material different from the metal containing layer, and performing the heating process to heat the substrate using a pulsed laser. The method further includes, after performing the heating process, determining a phase composition of the metal containing layer and a material composition of the metal containing layer using a diffraction technique, and using the phase composition and the material composition of the metal containing layer to determine the temperature of the substrate achieved by the heating process.temperature of the substrate achieved by the heating process.
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