Method for manufacturing treating liquid

TW202635383APending Publication Date: 2026-09-01FUJIFILM CORP
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Patent Information

Application Number
TW115112181
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-05-06
Filing Date
2021-06-24
Publication Date
2026-09-01

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Abstract

The objective of this invention is to provide a method for manufacturing a processing liquid with excellent filterability. The method for manufacturing the processing liquid of this invention uses a first filter having a first filter material to filter a purified material containing a surfactant to manufacture a processing liquid for a semiconductor substrate. In this method, the first filter material comprises at least one selected from the group consisting of nylon, polyallyl sulfonic acid, hydrophilically treated perfluoroalkoxyalkane, hydrophilically treated polytetrafluoroethylene, hydrophilically treated polyolefin, and hydrophilically treated polyvinylidene fluoride. The surfactant comprises at least one selected from the group consisting of a nonionic surfactant containing a group represented by formula (1) and anionic surfactant containing a group represented by formula (1). Formula (1) (LO)n L represents an alkyl group. n represents 3 to 55.
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