Method for manufacturing treating liquid
TW202635383APending Publication Date: 2026-09-01FUJIFILM CORP
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Patent Information
- Application Number
- TW115112181
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2021-05-06
- Filing Date
- 2021-06-24
- Publication Date
- 2026-09-01
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Figure TWG2TA001075350_001 
Figure TWG2TA001075350_002
Abstract
The objective of this invention is to provide a method for manufacturing a processing liquid with excellent filterability. The method for manufacturing the processing liquid of this invention uses a first filter having a first filter material to filter a purified material containing a surfactant to manufacture a processing liquid for a semiconductor substrate. In this method, the first filter material comprises at least one selected from the group consisting of nylon, polyallyl sulfonic acid, hydrophilically treated perfluoroalkoxyalkane, hydrophilically treated polytetrafluoroethylene, hydrophilically treated polyolefin, and hydrophilically treated polyvinylidene fluoride. The surfactant comprises at least one selected from the group consisting of a nonionic surfactant containing a group represented by formula (1) and anionic surfactant containing a group represented by formula (1). Formula (1) (LO)n L represents an alkyl group. n represents 3 to 55.
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