Thermal radiation shielding film, method for manufacturing thermal radiation shielding film
TW202635595APending Publication Date: 2026-09-01SUMITOMO METAL MINING CO LTD
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Patent Information
- Application Number
- TW114140011
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-10-18
- Filing Date
- 2025-10-16
- Publication Date
- 2026-09-01
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Abstract
A thermal radiation shielding film has a glass substrate, a first layer, and a second layer. The first layer contains one or more selected from tungsten oxide represented by the general formula WO3-x (0≦x≦0.28), silicon oxynitride represented by the general formula SiOaNb, and aluminum oxide. The second layer contains tungsten bronze. The first layer and the second layer are arranged sequentially from the position closest to the glass substrate. none
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