Semiconductor photoresist composition and method of forming patterns using the composition

TW202635703APending Publication Date: 2026-09-01SAMSUNG SDI CO LTD
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Patent Information

Application Number
TW115105602
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2026-02-03
Filing Date
2026-02-12
Publication Date
2026-09-01

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Abstract

The present invention relates to a semiconductor photoresist composition including an organometallic compound represented by Chemical Formula
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