Thinner composition

TW202635824APending Publication Date: 2026-09-01DONGWOO FINE CHEM CO LTD

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Patent Information

Application Number: TW115107113
Authority / Receiving Office: TW · TW
Patent Type: Applications
Current Assignee / Owner
Priority Date: 2025-02-27
Filing Date: 2026-02-26
Publication Date: 2026-09-01

Application Information

Patent Timeline

27 Feb 2025

Priority

26 Feb 2026

Application

TW115107113

01 Sep 2026

Publication

TW202635824A

IPC: C09D7/20; C09D7/63; G03F7/004; G03F7/11; H10P76/00; H10P76/20

Inventors: 李沼旼; 全季敏

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Abstract

The present invention provides a thinner composition comprising a lactone-based organic solvent, an aliphatic ether compound having a specific structure, and one or more of a ketone-based organic solvent or an ester-based organic solvent. The thinner composition according to the present invention has improved EBR and RRC properties due to excellent solubility for photoresist films and spin-on hardmasks (SOHs). The thinner composition according to the present invention can reduce hump heights and improve coating film uniformity.

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