Methods and apparatus for manufacturing aqueous solutions and photoresist patterns for electronic devices

TW202635870APending Publication Date: 2026-09-01MERCK PATENT GMBH
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Patent Information

Application Number
TW115119258
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-04-06
Filing Date
2021-04-01
Publication Date
2026-09-01

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Abstract

[Problem] To provide an aqueous solution for manufacturing electronic devices that can prevent pattern collapse or suppress unevenness in the width of photoresist patterns. [Solution] An aqueous solution for manufacturing electronic devices comprises an alkyl carboxylic acid compound (A) and a solvent (B), wherein the alkyl carboxylic acid compound (A) is represented by formula (a): A1-COOH Formula (a) (where A1 is a C4-12 alkyl group) and the solvent (B) comprises water.
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