Measuring arrangement for determining position and projection exposure apparatus

Abstract

which enclose a resonator cavity. The resonator cavity comprises a length adjustment range, wherein the measurement beam traverses the resonator cavity more than once. The optical resonator comprises at least one optical element or is assigned an optical element, said optical element being configured to control the beam radius of the measurement beam at the input coupling mirror and / or a Gouy phase of the measurement beam propagating in the resonator cavity, at least within the length adjustment range in the resonator cavity.

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