Method for measuring substrate temperature

Abstract

This invention relates to an apparatus and a method for measuring substrate temperature during the coating process (17) of a substrate (16) in a CVD reactor. Emission values ​​are measured at an emission wavelength (λ0) using a pyrometer (7). A first reflectance value (R1) is measured at a first wavelength (λ1) and a second reflectance value (R2) is measured at a second wavelength (λ2) using two detectors (8, 9). The emission value (E) and the two reflectance values ​​(R1) and (R2) are correlated by an adjustment device (18) to calculate the actual substrate temperature (TS). Alternatively, both emission values ​​(E1, E2) can be measured, and only one reflectance value can be measured. All three values ​​are also correlated to calculate the substrate temperature (TS).

Images