Methods and apparatus for radiation examination

TW202636105APending Publication Date: 2026-09-01HAMAMATSU PHOTONICS KK
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Patent Information

Application Number
TW114145704
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-09
Filing Date
2025-11-24
Publication Date
2026-09-01

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Abstract

The X-ray inspection method of the present invention includes: a first control step, which controls the incident position of the electron beam EB on the target material 22, which generates X-rays by incident electron beam EB, from a first incident position Y1 to a second incident position Y2; a second irradiation step, which emits the electron beam EB towards the second incident position Y2 of the target material 22 to irradiate the structure disposed on the mounting substrate SB with X-rays; and a second image acquisition step, which acquires an X-ray image of the structure disposed on the mounting substrate SB, i.e., a second image.
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