Atomic force microscope with probe distancer

TW202636122APending Publication Date: 2026-09-01NEARFIELD INSTR BV
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Patent Information

Application Number
TW114144127
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-12
Filing Date
2025-11-12
Publication Date
2026-09-01

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Abstract

Method of measuring a dimension of a nanometer sized high aspect ratio structure of a sample using a scanning probe microscope, the nanometer sized high aspect ratio structure comprising a recess having a height dimension in a direction transverse to the surface and a lateral dimension in a direction parallel to the surface, wherein the height dimension is greater than the lateral dimension; wherein the method comprises the steps of: - scanning the surface of the sample in a scanning direction parallel to the surface by a probe including a probe tip attached to the scanning probe microscope, and lowering, during the step of scanning, the probe tip into the recess such as to determine the dimension of the nanometer sized high aspect ratio structure; - wherein the recess comprises a recess width between at least two opposing sidewalls in a direction parallel to the scanning direction; - wherein the probe tip, which is lowered into the recess, comprises a base, an apex at an end of the base arranged to interface with the surface of the sample, and a distancer, wherein said base extends parallel to a longitudinal axis of the probe tip and wherein the distancer extends from the base such as to extend radially outward for defining a width of the probe tip including the distancer; and - wherein the width of the probe tip is smaller than the recess width.
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