Protective barrier for an exposure apparatus and method

TW202636214APending Publication Date: 2026-09-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW115100369
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-08-14
Filing Date
2026-01-06
Publication Date
2026-09-01

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Abstract

There is provided a protective membrane for an exposure apparatus for semiconductor manufacturing processes, the protective membrane comprising boron nitride nanotubes. A component of an exposure apparatus for semiconductor manufacturing processes comprising such protective membrane is also described. Also provided is an exposure apparatus for semiconductor manufacturing processes comprising such a protective membrane or component. Also described is the use of boron nitride nanotubes as a protective layer in semiconductor manufacturing processes or in an apparatus therefor.
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