Debris catcher, rotating target extreme ultraviolet (EUV) radiation generation system, and method of generating EUV radiation

Abstract

A debris catcher includes a concave surface configured to face a target material of a rotating target extreme ultraviolet (EUV) radiation generation system. The rotating target EUV radiation generation system includes a vessel, a crucible, and the catcher. A method of generating EUV radiation includes rotating the crucible, irradiating the target material to generate a plasma emitting the EUV radiation, and directing debris formed with the plasma using the catcher. A method of inspecting a photomask includes directing the EUV radiation to the photomask, capturing one or more images of patterned radiation reflected from the photomask, and processing the one or more images. A method of manufacturing a semiconductor device includes directing the EUV radiation to the photomask, exposing a photoresist layer to patterned radiation reflected from the photomask, developing the photoresist layer, and etching a substrate using the developed photoresist layer as a mask.

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