Method of obtaining prediction model, exposure apparatus, exposure method, information processing apparatus, article manufacturing method, and program

Abstract

A method of obtaining a prediction model for predicting fluctuation of imaging characteristics of a projection optical system which is used in an exposure apparatus that exposes a substrate via an original, the method including setting a first value, which is a value of a first coefficient in a first prediction model that is set based on a result of measuring fluctuation of imaging characteristics of a first projection optical system in a first exposure apparatus including the first projection optical system, as a value of the first coefficient in a second prediction model for predicting fluctuation of imaging characteristics of a second projection optical system in a second exposure apparatus including the second projection optical system, while temporarily setting a value of a second coefficient in the second prediction model to a default value.

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