Apparatus for extracting low energy ion beam

Abstract

A workpiece processing system for extracting ion beams at low extraction voltages is disclosed. The workpiece processing system includes an ion source with an extraction plate having an extraction aperture. A ground electrode is rigidly affixed to the extraction plate so as to tightly control the positioning accuracy between the extraction aperture and the aperture in the ground electrode. A suppression electrode is located between the extraction plate and the ground electrode. This suppression electrode is also rigidly mounted so as to create a fixed first gap between the extraction plate and the suppression electrode and a fixed second gap between the suppression electrode and the ground electrode. This system may be operated at extraction voltages as low as

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