Remote plasma reactor for semiconductor manufacturing facility

Abstract

According to the present invention, there is provided a remote plasma reactor for a semiconductor manufacturing facility, including a plasma reaction chamber, which provides a ring-shaped plasma reaction space in which a plasma reaction occurs, inside, and a magnetic core portion coupled to the plasma reaction chamber to surround at least a section of the plasma reaction space, wherein an injection direction of a source gas through a gas inlet is not toward the center of the plasma reaction space so that the source gas forms swirl in the plasma reaction space.

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