Monolithic semiconductor processing chamber

Abstract

A semiconductor processing chamber is disclosed herein. The semiconductor processing chamber includes a monolithic lower shell that has a substrate support having a top surface and a bottom surface, a sidewall disposed around the substrate support, a plurality of arms extending radially and symmetric inward from the sidewall to the substrate support, a plurality of passages symmetrically disposed around the substrate support, and a pumping plenum fluidly coupled to the plurality of passages. The pumping plenum is partially bounded by the bottom surface of the substrate support and a lower extension of the sidewall. The sidewall includes the lower extension extending past the bottom surface of the substrate support. Each passage of the plurality of passages is defined between the substrate support, two adjacent arms of the plurality of arms, and the sidewall.

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